Kurt J Lesker PVD 150 Mini Spectros RF/DC Magnetron Sputtering Thin Film Deposition System

Four 3” TORUS^® Mag Keeper™ UHV Compatible Circular Magnetron Sputtering Sources.

Capable of RF and DC sputtering and Pulsed DC Sputtering. Capable of co-deposition.

You can run multiple targets at the same time. Manual switches for power source selection to

each target. Also has two MFC gas inputs for gas mixing.

Six-inch substrate carrier capable of RF biasing and substrate heat up to 800° C.

Substrate rotation controls.

The Mini SPECTROS builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, real time recipe thread operation, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.

Core Capabilities & Technologies

• Deposition Techniques: Magnetron sputtering (TORUS sources).
• Substrate Capacity: Accommodates up to 6" (150mm) round or 4" x 4" (100mm x 100mm) square substrates.
• Vacuum Environment: UHV-grade chamber with oil-free backing pumps achieving base pressures in the 2 times 10^{-7}) mbar range. CTI Cryo Pump.
• Control Software: Utilizes PC graphic interface software platform for automated recipe creation, real-time control.
• 208V, 3Ph, 60Hz
• Vacuum chamber can be easily mounted to glove box for controlled environment.