Oxford Instruments OPAL ALD Atomic Layer Deposition System. The Oxford OpAL is a plasma or thermal assisted atomic layer deposition system ALD. It is an open loop (non-loadlocked) tool which had two channels for metal organic precursors, one channe1 for water and a plasma head. System Overview Hardware Details Single open-loop vacuum chamber with heated table and heated sidewalls 8.25" Heated table can run 80-300ºC Downstream 300 W RF plasma head with isolation valve Software to run loops of dose/purge cycles to enable ALD Substrate Requirements 8.25" Diameter circular, flat table. Substrates must be able to handle 100-250C heating depending on process. Due to aggressive pumping/purging very small samples or powders not recommended. 208V, 3Ph, 60Hz, 25A